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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable, with one-point correction of energy scale
Comment:
The sample was prepared by vapor deposition of 80 nm nickel layer on polycrystaline alpha-Al2O3 substrate and oxidation by annealing (T = 973 K, time = 3h, 80% O2/20 % N2). FAT mode. Emission angle = 15 degrees.