NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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Si

Fe/Si

FeSi₂

iron/silicon

CAS Registry No:

12022-99-0

silicide

Author Name(s):

Ruhrnschopf K., Borgmann D., Wedler G.

Thin Solid Films 280, 171

Pub Year:

1996

book All Records in this Publication

Chemical Shift

Line Designation:

CS-2p

Chemical Shift (eV):

0.20

Energy Uncertainty:

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

No

Anode Material:

Al

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

40 ML Fe were deposited onto Si(100)-(2x1) and annealed (T = 730 K, time = 60 min). The substrate was cleaned by Ar+ ion bombardment and rapid thermal annealing by electron beam heating ( T = 1500 - 1600 K). rapid thermal annealing by electron beam heating ( T = 1500 - 1600 K).

thin layer, vapor deposited and heated

Method of Determining Specimen Composition:

X-ray Photoelectron Spectroscopy

Method of Determining Specimen Crystallinity:

Low-energy Electron Diffraction

Specimen Temperature (K):

300

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