NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

One Page Summary

Instruction: Click on selected Tab for more information.

C

CH₃Si((C₆H₅)₂)OSi(CH₃)(C₆H₅)OSi((C₆H₅)₂)CH₃

pentaphenyltrimethylsiloxane

CAS Registry No:

3390-61-2

oxygen, phenyl benzene

Photoelectron Line

Line Designation:

1s, sat

Binding Energy (eV):

290.60

Energy Uncertainty:

Background Subtraction Method:

Linear

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

1.12

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Yes

Anode Material:

Al

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Ag3d5 = 368.27

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

FAT mode. The spectra were recorded at normal emission. Peak locations: Voigt function. The composition determined by XPS was Si0.083C0.856O0.061. The relative intensity was 0.02.

An error has occurred. This application may no longer respond until reloaded. Reload 🗙