NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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C

CH₃Si((C₆H₅)₂)OSi(CH₃)(C₆H₅)OSi((C₆H₅)₂)CH₃

pentaphenyltrimethylsiloxane

CAS Registry No:

3390-61-2

oxygen, phenyl benzene

Photoelectron Line

Line Designation:

1s, sat

Binding Energy (eV):

295.30

Energy Uncertainty:

Background Subtraction Method:

Linear

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

1.41

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Yes

Anode Material:

Al

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Ag3d5 = 368.27

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

FAT mode. The spectra were recorded at normal emission. Peak locations: Voigt function. The composition determined by XPS was Si0.083C0.856O0.061. The relative intensity was 0.01.

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