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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
5000 A TiSi2 with a resistivity of 15 microohm cm were deposited on B-doped Si(100) with a resistivity of 6.8 - 9.2 ohm cm and annealed (T= 1100 K, time = 4 min).