NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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Sn

SnO₁.₃₉

tin oxides (SnO1.39)

CAS Registry No:

non-stoichiometric oxide, oxide

Author Name(s):

Choi W.-K., Jung H.-J., Koh S.-K.

J. Vac. Sci. Technol. A 14, 359

Pub Year:

1996

book All Records in this Publication

Photoelectron Line

Line Designation:

3d_3/2

Binding Energy (eV):

494.81

Energy Uncertainty:

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Yes

Anode Material:

Al

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Adventitious carbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

The thin films were grown by a reactive ion assited deposition onto Si(100) and glass substrates. The sample was cleaned by Ar+ ion bombardment (Ep = 4 keV, Ip = ~ 5 mA, time = 60 s). An electron flood gun (Ep = 4 eV) was used for charge compensation.

insulator, sputter deposited, thin film

Method of Determining Specimen Composition:

X-ray Photoelectron Spectroscopy

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300

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