NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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Si

XeF₂/Si

SiF state and silicon atoms attached to SiF₃

xenon difluoride/silicon

CAS Registry No:

7440-21-3

element, fluoride

Author Name(s):

Simpson W.C., Yarmoff J.A., Hung W.H., McFeely F.R.

Surf. Sci. 355, L283

Pub Year:

1996

book All Records in this Publication

Chemical Shift

Line Designation:

CS-2p_3/2

Chemical Shift (eV):

1.00

Energy Uncertainty:

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

0.51

Gaussian Width (eV):

Lorentzian Width (eV):

0.080

Use of X-ray Monochromator:

No

Anode Material:

other source

X-ray Energy:

170

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Element

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

40 L XeF2/Si(111)-(7x7). The surface was lightly annealed to remove higher fluorides and then exposed to 400 L XeF2. Branching ratio = 0.50. The intensity ratio of the surface/bulk components was 0.25.

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