NIST X-ray Photoelectron Spectroscopy Database

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Total Records: 8

Element

Atomic No

Formula

Spectral Line

Energy (eV)

Details

XeF₂/Si

CS-2p_3/2

0.00

XeF₂/Si

CS-2p_3/2

1.00

XeF₂/Si

CS-2p_3/2

2.04

XeF₂/Si

CS-2p_3/2

3.07

XeF₂/Si

CS-2p_3/2

0.00

XeF₂/Si

CS-2p_3/2

1.05

XeF₂/Si

DS-2p

0.60

XeF₂/Si

DS-2p

0.60

Chemical Shift

CS-2p_3/2

3.07

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

0.63

Gaussian Width (eV):

Lorentzian Width (eV):

0.080

Use of X-ray Monochromator:

Anode Material:

other source

X-ray Energy:

170

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Element

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

40 L XeF2/Si(111)-(7x7). The surface was lightly annealed to remove higher fluorides and then exposed to 400 L XeF2. Branching ratio = 0.50. The intensity ratio of the surface/bulk components was 0.22.