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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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[Rh2(HCOO)4(NH2C6H4COOH)2]
bis(aminobenzoicacid-N)tetrakis(mu-(formato-O,O'))dirhodium
acid, amine, carboxylic acid, formato ligand, nitrogen, organic acid, organometallic, oxygen, phenyl benzene

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