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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
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General:
Citation
Data Processing:
Measurement:
Specimen:
Element:
Ti
Formula:
TiO
2
XPS Formula:
Ti*O
2
Name:
titanium(IV) dioxide
CAS Registry No:
13463-67-7
Class:
catalyst, IV-VI semiconductor, mineral, oxide
Author Name(s):
Bender H., Chen W., Portillo J., Van den Hove L., Wandervorst W.
Journal:
Appl. Surf. Sci. 38, 37
DOI:
10.1016/0169-4332(89)90516-3
Pub Year:
1989
book
All Records in this Publication
Data Type:
Photoelectron Line
Line Designation:
2p
Binding Energy (eV):
458.30
Energy Uncertainty:
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):
Use of X-ray Monochromator:
No
Anode Material:
Al
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Charge Reference:
Adventitious carbon
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
A 150 nm thick Ti film was deposited on p-type Si(100) using DC magnetron sputtering.
Specimen:
sputter deposited
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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