NIST X-ray Photoelectron Spectroscopy Database

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TiSi₂

TiSi*₂

titanium disilicide

12039-83-7

II-VI semiconductor, silicide

Peto G., Zsoldos E., GucziZ L., Schay Z.

Solid State Commun. 57, 817

Pub Year:

1986

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Photoelectron Line

2p_3/2

98.80

data

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

TiSi2 films were prepared by solid phase reaction between the evaporated Ti layer (20 nm thick) and the Si(111) substrate and annealed at 973 K.