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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
0.3 ML La/Si(111). Clean Si(111) surfaces were prepared by cleaving of n-type (resistivity is 36 Ohm cm) single crystal silicon. The amount of deposited La was measured with a quartz microbalance.