NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

One Page Summary

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Element:

Formula:

TiN₁.₁₉

XPS Formula:

TiN₁.₁₉

Name:

titanium nitride (TiN1.19)

CAS Registry No:

Class:

nitride

Author Name(s):

Burrow B.J., Morgan A.E., Ellwanger R.C.

Journal:

J. Vac. Sci. Technol. A 4, 2463

DOI:

Pub Year:

1986

book All Records in this Publication

Photoelectron Line

397.00

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Other, Ti2p3/2 = 453.98

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

100 nm TiN films were prepared in dc magnetron reactive sputter system on single-crystal silicon.

Specimen:

reaction by bombarding ions, sputter deposited, thin film

Method of Determining Specimen Composition:

Rutherford Backscattering Spectrometry

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300