NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

One Page Summary

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Element:

Si₃N₄

silicon(IV) nitride

12033-89-5

nitride, silicide

Ingo G.M., Zacchetti N., della Sala D., Coluzza C.

Journal:

J. Vac. Sci. Technol. A 7, 3048

DOI:

Pub Year:

1989

book All Records in this Publication

Photoelectron Line

398.20

Background Subtraction Method:

Shirley

Peak Location Method:

other type of curve fit

Full Width at Half-maximum Intensity (eV):

1.62

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Yes

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Au,Cu = 84.00,932.67

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable, with two-point correction of energy scale

Comment:

Reaction bonded and hot pressed Si3N4 films were prepared by chemical vapour deposition onto Si(100) substrate.

Specimen:

amorphous, annealed, chemical vapor deposition, pelletized, thin film

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300