NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

One Page Summary

Instruction: Click on selected Tab for more information.

Element:

Formula:

SiOx/Si

XPS Formula:

SiO*x/Si

Name:

silicon oxides/silicon

CAS Registry No:

11126-22-0

Class:

anhydride, element, IV-VI semiconductor, non-stoichiometric oxide, oxide

Author Name(s):

Cros A., Saoudi R., Hewett C.A., Lau S.S., Hollinger G.

Journal:

J. Appl. Phys. 67, 1826

DOI:

Pub Year:

1990

book All Records in this Publication

Photoelectron Line

532.80

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

1.62

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Yes

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

0.7

Calibration:

Au4f7 = 84.00

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

Si(100) was oxidized at 573 K for 2 h. determined by trasmission electron microscopy.