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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
The nitrogenation was carried out by bombarding the metal with 8-keV Ar+ ions in nitrogen at 1.0E-3 Pa. The approximate thickness of the TiN films obtained under these conditions was ~7 nm which is complete with to the range of the Ar+ ions.