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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
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General:
Citation
Data Processing:
Measurement:
Specimen:
Element:
Si
Formula:
SiOx/Si
XPS Formula:
Si*Ox/Si
Name:
silicon oxides/silicon
CAS Registry No:
11126-22-0
Class:
anhydride, element, IV-VI semiconductor, non-stoichiometric oxide, oxide
Author Name(s):
Belton D.N., Harris S.J., Schmieg S.J., Weiner A.M., Perry T.A.
Journal:
Appl. Phys. Lett. 54, 416
DOI:
10.1063/1.100938
Pub Year:
1989
book
All Records in this Publication
Data Type:
Chemical Shift
Line Designation:
CS-2p
Chemical Shift (eV):
3.70
Energy Uncertainty:
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):
Use of X-ray Monochromator:
No
Anode Material:
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Charge Reference:
Element
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
SiOx/Si(100). A native oxide.
Specimen:
native oxide, passive oxide, thin layer
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
293
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