NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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O

(^-OC(O)NHC₆H₄CH₂C₆H₄NHC(O)OCH₂(CF₂)₂CH₂^-)n

poly(oxycarbonylamino-1,4-phenylenemethylene-1,4-phenyleneaminocarbonyloxy(2,2,3,3-tetrafluorobutane-diyl))

CAS Registry No:

amide, halogenated compound, multiple rings, nitrogen, oxygen, phenyl benzene, polymer, sulfur

Author Name(s):

Yoon S.C., Ratner B.D.

Macromolecules 19, 1068

Pub Year:

1986

book All Records in this Publication

Photoelectron Line

Line Designation:

1s, sat

Binding Energy (eV):

538.70

Energy Uncertainty:

Background Subtraction Method:

other

Peak Location Method:

Gaussian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Yes

Anode Material:

Al

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Au4f7 = 84.00

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

An electron flood gun (Ep=10-15 eV) was used for charge compensation. The films were 200 - 800 A in thickness. The composition determined by XPS was C65.31O13.76N7.21F13.71

cast film, insulator, thick film, thin film

Method of Determining Specimen Composition:

X-ray Photoelectron Spectroscopy

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300

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