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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
0.1 and 5 ML Ba/n-type As-doped Si(100)-(2x1). The substrate was cleaned by etching in a 1% HF in water solution, followed by mild Ar+ ion bombardment and annealing by direct current flow through the sample.