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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Details Summary:
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General:
Citation
Data Processing:
Measurement:
Specimen:
Element:
N
Formula:
(
-
O)
3
Si(CH
2
)
3
NHC(O)(CH
2
)
16
CH
3
/Si
XPS Formula:
hydrogen
-
bonded nitrogen atoms
Name:
N-propyloctadecanamide covalently bonded to oxidized silicon
CAS Registry No:
7440-21-3
Class:
amide, nitrogen, organometallic, oxygen
Author Name(s):
Kallury K.M.R., Debono R.F., Krull U.J., Thompson M.
Journal:
J. Adhesion Sci. Technol. 5, 801
DOI:
10.1163/156856191X00224
Pub Year:
1991
book
All Records in this Publication
Data Type:
Photoelectron Line
Line Designation:
1s
Binding Energy (eV):
401.70
Energy Uncertainty:
Background Subtraction Method:
other
Peak Location Method:
Gaussian
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):
Use of X-ray Monochromator:
No
Anode Material:
Mg
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Charge Reference:
Internal hydrocarbon
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
The thickness of the film determined by ellipsometry is 30+-3 A. The relative intensity was 0.13. The spectra were recorded at normal emission.
Specimen:
thin film
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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