NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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O

(^-C₆H₄C(CH₃)₂C₆H₄OC₆H₄S(O)₂C₆H₄O^-)n

(^-C₆H₄C(CH₃)₂C₆H₄O*C₆H₄S(O)₂C₆H₄O*^-)n

poly(sulfone)

CAS Registry No:

25135-51-7

ether, oxygen, phenyl benzene, polymer, sulfonyl, sulfur

Author Name(s):

Pertsin A.J., Gorelova M.M., Levin V.Y., Makarova L.I.

J. Appl. Polymer Sci. 45, 1195

Pub Year:

1992

book All Records in this Publication

Photoelectron Line

Line Designation:

1s

Binding Energy (eV):

531.90

Energy Uncertainty:

Background Subtraction Method:

other

Peak Location Method:

Gaussian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

No

Anode Material:

Mg

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Au,Ag,Cu = 84.00,368.27,932.67

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

The composition determined by XPS was C0.88O0.10S0.04. FRR mode. The fitting was done in accordance with the stoichiometry. The relative intensity was 0.5. No x-ray induced damage to the sample was detected during analysis.

insulator, thick film

Method of Determining Specimen Composition:

X-ray Photoelectron Spectroscopy

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300

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