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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
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General:
Citation
Data Processing:
Measurement:
Specimen:
Element:
Ti
Formula:
TiN/Ti
XPS Formula:
Ti*N/Ti
Name:
titanium nitride/titanium
CAS Registry No:
25583-20-4
Class:
nitride
Author Name(s):
Siemensmeyer B., Bade K., Schultze J.W.
Journal:
Ber. Bunsenges. Phys. Chem. 95, 1461
Pub Year:
1991
book
All Records in this Publication
Data Type:
Photoelectron Line
Line Designation:
2p
3/2
Binding Energy (eV):
455.50
Energy Uncertainty:
0.2
Background Subtraction Method:
Shirley
Peak Location Method:
mixed Gaussian/Lorentzian
Full Width at Half-maximum Intensity (eV):
2.0
Gaussian Width (eV):
Lorentzian Width (eV):
Use of X-ray Monochromator:
No
Anode Material:
Al
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Au,Ag,Cu = 84.00,368.27,932.67
Charge Reference:
Conductor
Energy Scale Evaluation:
Calibration study
Comment:
The TiN layers with a thickness of about 80 A were prepared by implantation of 3 keV N2+ into polycrystalline Ti. The N+ ion dose was about 3E17 cm-2. FAT mode. The total FWHM is 2.0 eV.
Specimen:
implanted, thin layer
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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