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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
The TiN layers with a thickness of about 80 A were prepared by implantation of 3 keV N2+ into polycrystalline Ti. The N+ ion dose was about 3E17 cm-2. FAT mode. The total FWHM is 2.1 eV.