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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
10 A GaAsOx/n-type GaAs(100). The oxide was formed by O2 exposure (p = 100 Torr, T = 773 K, time = 1000 s). The energy is referenced to the bulk state of the As2p3/2 line.