NIST X-ray Photoelectron Spectroscopy Database

Click the column to sort in ascending or descending order.
Enter a string in the input box in the column header and press the enter to filter the search result in the selected column.
Click on the hyperlink in the column for more information.

Total Records: 14

Element

Atomic No

Formula

Spectral Line

Energy (eV)

Details

SiH₀.₂₆

2p_3/2

99.10

SiH₀.₀₂

2p_3/2

98.80

SiH₀.₀₁

2p_3/2

98.90

SiH₀.₂₅

2p_3/2

99.20

SiH₀.₂₅

2p_3/2

99.20

SiH₀.₃₃

2p_3/2

99.40

SiH₀.₀₂

2p_3/2

98.90

SiH₀.₃₃

2p_3/2

99.30

SiH₀.₃₅

2p_3/2

99.50

SiH₀.₄₀

2p_3/2

99.00

SiH₀.₄₆

2p_3/2

99.00

SiH₀.₀₁

2p_3/2

99.00

SiH₀.₄₇

2p_3/2

99.00

SiH₀.₅₅

2p_3/2

99.00

Photoelectron Line

2p_3/2

98.90

0.1

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Au4f7 = 84.00

Charge Reference:

Adventitious carbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

The samples were prepared by planar rf reactive magnetron sputtering at substrate temperature of 300 K. The sample consists of high-density regions of 50-200 A lateral dimensions separated by a low-density network.