Comment:
An exposure of 1.5 L CH3OH onto Pd(100) was followed by annealing at 200 K and 400 K. The substrate was treated by Ar+ ion bombardment (Ep = 1 keV, j =2 microampers/cm2), annealing (T = 1100 K), oxidation (1E-7 mbar of O2 , T= 800 K), and short annealing (T = 1200 K). Emission angle =16 degrees.