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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable, with one-point correction of energy scale
Comment:
2.0 +- 0.5 L HN3/B-doped Si(111)-(7x7) with a resistivity of 10 ohm cm. The substrate was annealed at temperature more than 1500 K. The curve fitting was based on equal FWHMs and intensities of the nitrogen states (H-N*=N=&N and H-N=N=&N*).