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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
1E13 L O2 were adsorbed onto 3 ML Y/GaAs(100) at 673 K. The energy is referenced to the bulk state of the Ga3d line. The substrate was cleaned by Ar+ ion bombardment (Ep = 1 keV) and annealing (T = 723 K).