NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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Si

FeSi₂

iron disilicide

CAS Registry No:

12022-99-0

silicide

Author Name(s):

Sirotti F., De Santis M., Rossi G.

Phys. Rev. B 48, 8299

Pub Year:

1993

book All Records in this Publication

Photoelectron Line

Line Designation:

2p_3/2

Binding Energy (eV):

99.70

Energy Uncertainty:

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

0.38

Lorentzian Width (eV):

0.18

Use of X-ray Monochromator:

No

Anode Material:

other source

X-ray Energy:

170

Overall Energy Resolution (eV):

0.38

Calibration:

FL = Fermi level

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

Beta-FeSi2 was grown in situ by reactive deposition of Fe onto an atomically clean Si(111)-(7x7) surface maintained at 873 K by flowing a direct current through the silicon wafer. Asymmetry parameter = 0.0 The relative intensity was 0.69.

beta phase, crystal, vapor deposited and heated

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

X-ray Diffraction

Specimen Temperature (K):

300

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