NIST X-ray Photoelectron Spectroscopy Database

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Total Records: 23

Element

Atomic No

Formula

Spectral Line

Energy (eV)

Details

CoSi₂

3p_3/2

60.00

CoSi₂

3p_1/2

61.43

3p_3/2

59.00

3p_1/2

60.03

3p_3/2

75.00

3p_1/2

77.50

3p_3/2

52.10

3p_1/2

53.87

FeSi

3p_3/2

52.70

FeSi

3p_1/2

53.65

FeSi₂

3p_3/2

53.60

FeSi₂

3p_1/2

54.64

FeSi₂

3p_3/2

53.10

FeSi₂

3p_1/2

54.14

FeSi

2p_1/2

99.00

FeSi

2p_3/2

98.60

FeSi₂

2p_3/2

99.70

FeSi₂

2p_1/2

99.30

FeSi₂

2p_1/2

99.20

FeSi₂

2p_3/2

98.90

2p_3/2

99.10

2p_1/2

99.40

2p_1/2

99.40

Photoelectron Line

2p_1/2

99.30

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

0.38

Lorentzian Width (eV):

0.1

Use of X-ray Monochromator:

Anode Material:

other source

X-ray Energy:

170

Overall Energy Resolution (eV):

0.38

Calibration:

FL = Fermi level

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

Beta-FeSi2 was grown in situ by reactive deposition of Fe onto an atomically clean Si(111)-(7x7) surface maintained at 873 K by flowing a direct current through the silicon wafer. Asymmetry parameter = 0.0. The relative intensity was 0.31.