NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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Si

Si/B/K

surface state

titanium dioxide/potassium

CAS Registry No:

7440-21-3

element

Author Name(s):

Weitering H.H., Chen J., DiNardo N.J., Plummer E.W.

Phys. Rev. B 48, 8119

Pub Year:

1993

book All Records in this Publication

Interface Core-Level Shift

Line Designation:

INT-2p_3/2

Interface Core-Level Shift:

-1.11

Energy Uncertainty:

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

0.55

Lorentzian Width (eV):

0.462

Use of X-ray Monochromator:

Yes

Anode Material:

other source

X-ray Energy:

120

Overall Energy Resolution (eV):

0.5

Calibration:

FL = Fermi level

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

Saturation coverage of K on Si(111)-(R3xR3)R30-B. The substrate was prepared by exposing he clean lightly-doped n-type surface (7x7) with a resistivity of 1 ohm cm to B10H14 and by subsequent annealing (T = 1173 K). The relative intensity was 0.68. Branching ratio = 0.5.

crystal, multilayer structure, semiconductor, thin layer, vapor deposited

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Low-energy Electron Diffraction

Specimen Temperature (K):

300

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