NIST X-ray Photoelectron Spectroscopy Database

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Total Records: 2

Data Type:

Photoelectron Line

Line Designation:

Binding Energy (eV):

532.60

Energy Uncertainty:

0.1

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Adventitious carbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

Si(100) was exposed to 600 L O2 at 1020 K and annealed (T = 1020 K, time = 10 min). The substrate was cleaned by cycles of Ar+ ion bombardment (Ep = 3.5 keV) and annealing (T = 1100 K).