NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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Si

Si/NH₃

silicon atoms attached to H

silicon/ammonia

CAS Registry No:

7440-21-3

element, hydride, nitride

Author Name(s):

Dufour G., Rochet F., Roulet H., Sirotti F.

Surf. Sci. 304, 33

Pub Year:

1994

book All Records in this Publication

Chemical Shift

Line Designation:

CS-2p

Chemical Shift (eV):

0.35

Energy Uncertainty:

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

0.45

Lorentzian Width (eV):

0.1

Use of X-ray Monochromator:

Yes

Anode Material:

other source

X-ray Energy:

135

Overall Energy Resolution (eV):

0.3

Calibration:

FL = Fermi level

Charge Reference:

Element

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

60 L NH3 were adsorbed onto Si(111)-(7x7) at 90 K and annealed at 300 K. The Si wafer was cleaned by heating at 1323 K for 15 s. The relative intensity was 0.242. Branching ratio = 0.5.

adsorbed, annealed, crystal, reacted, wafer

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Low-energy Electron Diffraction

Specimen Temperature (K):

300

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