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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
n-type P-doped Si(100)-(2x1) with a resistivity of 0.67 - 1.33 ohm cm was prepared by resistive heating to 1123 - 1173 K followed by a slow cool down process. Branching ratio = 0.5.