NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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C

CF₃(CF₂)₇C(O)NH(CH₂)₂SH/Au

CF₃(CF₂)₇C(O)NHCH₂C*H₂SH

2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-heptadecafluoro-N-(2-mercaptoethyl)nonanamide/gold

CAS Registry No:

amide, halogenated compound, nitrogen, thiol

Author Name(s):

Lenk T.J., Hallmark V.M., Hoffmann C.L., Rabolt J.F., Castner D.G., Erdelen C., et al.

Langmuir 10, 4610

Pub Year:

1994

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Photoelectron Line

Line Designation:

1s

Binding Energy (eV):

284.30

Energy Uncertainty:

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Yes

Anode Material:

Al

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Au4f7 = 84.00

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

The film thickness was measured by XPS. The spectra were recorded at normal emission and 55 and 80 degrees. The composition determined by XPS at 55 degrees was Au16.9F53.6C26.8S1.1N1.6.

surface coverage from 1ML to 2ML (1ML <= coverage < 2ML), thin layer

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300

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