NIST X-ray Photoelectron Spectroscopy Database

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Total Records: 16

Element

Atomic No

Formula

Spectral Line

Energy (eV)

Details

GaAsOx/GaAs

CS-3d_5/2

3.10

GaAsOx/GaAs

CS-3d_5/2

4.50

Si/GaAsOx/GaAs

CS-3d

0.55

GaAs

CS-3d_5/2

0.82

GaAsOx/GaAs

CS-3d_5/2

0.70

GaAsOx/GaAs

CS-3d_5/2

1.30

Si/GaAsOx/GaAs

CS-2p

0.95

Si/GaAsOx/GaAs

CS-2p

1.75

Si/GaAsOx/GaAs

CS-2p

2.50

Si/GaAsOx/GaAs

CS-2p

3.10

GaAs

CS-3d_5/2

-0.67

GaAs

DS-3d

0.69

Si/GaAsOx/GaAs

DS-2p

0.60

GaAs

DS-3d

0.45

GaAs

SS-3d_5/2

0.29

GaAs

SS-3d_5/2

-0.40

Chemical Shift

CS-3d

0.55

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

0.50

Lorentzian Width (eV):

0.17

Use of X-ray Monochromator:

Yes

Anode Material:

other source

X-ray Energy:

126.10

Overall Energy Resolution (eV):

0.35

Calibration:

Charge Reference:

Element

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

4 A Si/~ 8 A GaAsOx/GaAs(110)-(1x1). Electron-stimulated oxidation (Ep = 150 eV) of Na-doped (n = 1.7E18 cm-3) As-capped p-GaAs(110)-(1x1). The energy is referenced to the bulk state of the As3d line. The Gaussian FWHM represents the intrinsic value, not including the experimental resolution.