NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

One Page Summary

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Element:

Si/Zr

silicon/zirconium

7440-21-3

element, silicide

Yamauchi T., Kitamura H., Wakai N., Zaima S., Koide Y., and Yasuda Y.

Journal:

J. Vac. Sci. Technol. A 11, 2619

DOI:

Pub Year:

1993

book All Records in this Publication

Photoelectron Line

2p_3/2

98.70

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

FL = Fermi level

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

35 A Zr/Si(100)-(2x1) annealed at 673 K for 40 min. The substrate was p-type Si(100) wafer with a resistivity of 1 to 5 ohm cm.

Specimen:

reacted, thin film, vapor deposited and heated, wafer

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Reflection High-Energy Electron Diffraction

Specimen Temperature (K):

300