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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable, with one-point correction of energy scale
Comment:
2 L CH3OH were adsorbed onto Ti48Al52 at 160 K. The substrate was cleaned by cycles of Ar+ ion bombardment (Ep = 2 keV), and annealing (T = 1273 K, time = 5 min).