NIST X-ray Photoelectron Spectroscopy Database

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Total Records: 12

Element

Atomic No

Formula

Spectral Line

Energy (eV)

Details

TiN

397.17

TiN

396.97

TiN₀.₉

396.97

TiN₀.₉

1s, sat

398.67

TiN₀.₉

397.17

TiN

2p_3/2

454.77

TiN

2p_3/2

455.17

2p_3/2

454.07

TiN₀.₉

2p_3/2

455.17

TiN₀.₉

2p_3/2, sat

456.87

TiN₀.₉

2p_3/2

454.77

2p_3/2

454.07

Photoelectron Line

1s, sat

398.67

0.05

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

0.75

Calibration:

Ag3d5, PdFL= 368.27, 0.0

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

The 14-nm-thin TiN film was grown by reactive evaporation of Ti in a nitrogen atmosphere (p = 5E-4 - 5E-6 Torr). The thickness was measured using a quartz-crystal thickness monitor. FAT mode. Emission angle = 15 degrees.