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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
B
Formula:
B17.8Si17.0O47.5N19.1
XPS Formula:
oxide state
Name:
boron silicon oxide nitride (B17.8Si17.0O47.5N19.1)
CAS Registry No:
Class:
nitride, oxide

Citation:
Author Name(s):
Bois L., L'Haridon P., Laurent Y., Gouin X., Grange P., Letard J.-F., et al.
Journal:
J. Alloys and Compounds 232, 244
DOI:
Pub Year:
1996

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
1s
Binding Energy (eV)
192.80
Energy Uncertainty:
Background Subtraction Method:
other
Peak Location Method:
mixed Gaussian/Lorentzian
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
Yes
Anode Material:
Al
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Charge Reference:
Adventitious carbon
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
The sample was prepared by the reaction of gaseous ammonia with B19.2Si15.3O65.4 at 1273 K. An electron flood gun (Ep = 6eV) and a nickel grid placed 3mm above the sample surface were used for charge compensation. FAT mode. The relative intensity was 0.38.

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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