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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
Si
Formula:
TaSi2
Name:
tantalum disilicide
CAS Registry No:
12039-79-1
Class:
IV-VI semiconductor, silicide

Citation:
Author Name(s):
Riviere J.C., Crossley J.A.A.
Journal:
Surf. Interface Anal. 8, 173
DOI:
Pub Year:
1986

Data Processing:
Data Type:
Auger Parameter
Line Designation:
AP-1s, KL23L23(1D)
Auger Parameter (eV)
3456.70
Energy Uncertainty:
Background Subtraction Method:
Peak Location Method:
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Au
Charge Reference:
Energy Scale Evaluation:
Comment:

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
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