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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
Ta
Formula:
Ta2O5
XPS Formula:
Ta2O5
Name:
ditantalum pentoxide
CAS Registry No:
1314-61-0
Class:
anhydride, oxide

Citation:
Author Name(s):
Ohfuji S., Hashomoto C.
Journal:
J. Vac. Sci. Technol. B 4, 714
DOI:
Pub Year:
1986

Data Processing:
Data Type:
Chemical Shift
Line Designation:
CS-4f7/2
Chemical Shift (eV)
4.50
Energy Uncertainty:
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Charge Reference:
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
Ta films, about 20nm in thickness were deposited by reactive sputtering in a mixture of Ar and H2 gases onto the Si wafers at 300 K. Oxidation of Ta films was carried out using a quartz tube furnace in dry oxygen atmosphere at 673-773 K.

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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