There was a problem with the connection!

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
Si
Formula:
Si3N4
Name:
silicon(IV) nitride
CAS Registry No:
12033-89-5
Class:
nitride, silicide

Citation:
Author Name(s):
Ingo G.M., Zacchetti N., della Sala D., Coluzza C.
Journal:
J. Vac. Sci. Technol. A 7, 3048
DOI:
Pub Year:
1989

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
2p3/2
Binding Energy (eV)
102.08
Energy Uncertainty:
Background Subtraction Method:
Shirley
Peak Location Method:
other type of curve fit
Full Width at Half-maximum Intensity (eV):
1.58
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
Yes
Anode Material:
Al
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Au,Cu = 84.00,932.67
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable, with two-point correction of energy scale
Comment:
Reaction bonded and hot pressed Si3N4 films were prepared by chemical vapour deposition onto Si(100) substrate.

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
An error has occurred. This application may no longer respond until reloaded. Reload 🗙