NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

(^-CH₂C(CH₃)(C(O)OCH₃)^-)n

XPS Formula:

(^-C*H₂C*(C*H₃)(C(O)OCH₃)^-)n

Name:

poly(2-methyl methacrylate)

CAS Registry No:

9011-14-7

Class:

ester, oxygen, polymer

Citation:

Author Name(s):

Laoharojanaphand P., Lin T.J., Stoffer J.O.

Journal:

J. Appl. Polymer Sci. 40, 369

DOI:

Pub Year:

1990

book All Records in this Publication

Data Processing:

Photoelectron Line

284.80

Background Subtraction Method:

other

Peak Location Method:

Gaussian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Au4f7 = 84.00

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

293