NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

K

K/B/Si

potassium/boron/silicon

CAS Registry No:

7440-09-7

element

Citation:

Author Name(s):

Weitering H.H., Chen J., DiNardo N.J., Plummer E.W.

Phys. Rev. B 48, 8119

Pub Year:

1993

book All Records in this Publication

Data Processing:

Photoelectron Line

Line Designation:

3p

Binding Energy (eV)

19.30

Energy Uncertainty:

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Yes

Anode Material:

other source

X-ray Energy:

41.2

Overall Energy Resolution (eV):

Calibration:

FL = Fermi level

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

1 ML K/Si(111)-(R3xR3)R30-B. The substrate was prepared by exposing the clean lightly-doped n-type surface (7x7) with a resistivity of 1 ohm cm to B10H14 and by annealing (T = 1173 K). The spectra were recorded at normal emission.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Low-energy Electron Diffraction

Specimen Temperature (K):

77

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