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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
Si
Formula:
SiH0.02
Name:
silicon hydride (SiH0.02)
CAS Registry No:
Class:
alloy, hydride

Citation:
Author Name(s):
Das S.R., Webb J.B., de Castro S.C., Sundaram V.S.
Journal:
J. Appl. Phys. 60, 2530
DOI:
Pub Year:
1986

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
2p3/2
Binding Energy (eV)
98.80
Energy Uncertainty:
0.1
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Al
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Au4f7 = 84.00
Charge Reference:
Adventitious carbon
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
The samples were prepared by planar rf reactive magnetron sputtering at substrate temperature of 498 K. Two level microstructure consisting of 300-500 A dimensions columns separated by a pronounced low-density network(LDN). The columns are composed of 50-200 A high-energy regions interspersed with LDN.

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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