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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:


Tab Page Summary

General:
gallium(III) arsenide
arsenide, II-VI semiconductor, III-V semiconductor

Citation:
Chambers S.A., Loebs V.A.
Phys. Rev. B 47, 9513
Pub Year:
1993

Data Processing:
Photoelectron Line
mixed Gaussian/Lorentzian

Measurement:
Anode Material:
Al
X-ray Energy:
Overall Energy Resolution (eV):
0.73
Calibration:
FL = Fermi level
Charge Reference:
Valence band minimum
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
n-type Si-doped GaAs(001)-(2x4) with a carrier concentration of 5E17 cm-3. Branching ratio = 0.65.The intensity ratio of the Gaussian/Lorentzian components was 60/40. The As cap was desorbed by heating at ~723 K for several minutes. The thickness was measured using a quartz-crystal thickness monitor.

Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Low-energy Electron Diffraction
Specimen Temperature (K):
300

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