NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Si/O₂

silicon/oxygen

7440-21-3

element, non-stoichiometric oxide, oxide

Citation:

Author Name(s):

Lu Z.H., Graham M.J., Jiang D.T., Tan K.H.

Journal:

Appl. Phys. Lett. 63, 2941

DOI:

Pub Year:

1993

book All Records in this Publication

Data Processing:

Data Type:

Doublet Separation for Photoelectron Lines

Line Designation:

DS-2p

Double Separation (eV)

0.61

Energy Uncertainty:

Background Subtraction Method:

Shirley

Peak Location Method:

Gaussian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

other source

X-ray Energy:

130

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Element

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

6E3 L O2/Si(100)-(2x1). Adsorption of O2 was performed at 2E-5 Torr at 1023 K for 5 min. Emission angle = 36 degrees.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Low-energy Electron Diffraction

Specimen Temperature (K):

300