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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
Ta
Formula:
Ta2O5/Ta2N
XPS Formula:
Ta*2O5/Ta2N
Name:
ditantalum pentoxide/ditantalum nitride
CAS Registry No:
1314-61-0
Class:
nitride, oxide

Citation:
Author Name(s):
Prieto P., Galan L., Sanz J.M.
Journal:
Appl. Surf. Sci. 70, 186
DOI:
Pub Year:
1993

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
4f7/2
Binding Energy (eV)
27.05
Energy Uncertainty:
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
1.35
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Mg
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
FL = Fermi level
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
22 A Ta2O5/3000 A Ta2N/glass. The oxide film was prepared by oxidation of Ta2N in atmospheric air (40 % humidity, T = 300 K, time = 3min). Ta2N thin film was grown by reactive sputtering in a nitrogen atmosphere.

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
X-ray Diffraction
Specimen Temperature (K):
300
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