There was a problem with the connection!

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
C
Formula:
HCHO/Si
XPS Formula:
dissociatively adsorbed formaldehyde
Name:
formaldehyde/silicon
CAS Registry No:
50-00-0
Class:
aldehyde, catalyst

Citation:
Author Name(s):
Tanaka K., Matsuzaki S., Toyoshima I.
Journal:
J. Phys. Chem. 97, 5673
DOI:
Pub Year:
1993

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
1s
Binding Energy (eV)
285.40
Energy Uncertainty:
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Mg
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Si2p = 99.34
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
0.1 L HCHO was deposited onto B-doped p-type Si(111) wafer with a resistivity of 1.6 - 2.1 ohm cm. The C1s spectrum has a tail toward lower binding energy. The substrate was cleaned by repeating an Ar+ ion bombardment at 298 K and resistive heating at 623 K, then finally annealed at 1273 K for 30 s.

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
298
An error has occurred. This application may no longer respond until reloaded. Reload 🗙